Content

Light & Engineering 33 (2) 2025
Volume 33Date of publication 04/17/2025
Pages 38–49
Abstract:
As the analysis of lighting devices used to illuminate large-size paintings shows, in museum practice, with the exception of isolated cases, there is no equipment that would exclude the appearance of extraneous images on the painting field under various operating conditions (specialized galleries, palace-museums, churches-museums). This effect is especially evident when protecting the painting layer with glass, which only increases the number of situations of unacceptable distortion of the pictorial image. In addition, traditional methods of lighting large-size canvases use a large set of lighting devices, which, as a consequence, leads to significant power consumption. The aim of the proposed work is an attempt to develop a method using equipment that allows to get rid of the shortcomings inherent in the traditional approach to lighting large-sized paintings and, in particular, in the case of their installation behind protective glass. The paper provides an analysis of the main problems of lighting large-sized paintings that arise when they are installed behind protective glass. Possible technical solutions to overcome them are described in detail. The results of research and development that underlie these solutions are presented.
References:
1. Boos, G.V., Novakovsky, L.G. Museum Lighting in Reference book on lighting technology / Under the general editorship of J.B. Aizenberg and G.V. Boos; 4th ed., revised and enlarged, Moscow: Editorial office of the journal Svetotekhnika/Light & Engineering, 2019, pp. 468–494. 2. Fontuanon, M., Piqueras, L. Lighting “Mona Lisa” Advanced Daylighting and Lighting Solutions // Proceedings of the International Conference “Energy Efficient Lighting” China, Shanghai 2005. 3. Miras, J-P., Novakovsky, L.G., Fontuanon, M. Illumination of the Mona Lisa -New Lighting Solutions // Light & Engineering, 2005, Vol. 15, # 5. 4. Novakovsky, L.G., Fontuanon, M., Miras, J-P., de Vecchi, P., Chanusso, J., Angelini, M., Marty, K., Duchene, G., Makita, K. “Mona Lisa” in a New Light [“Mona Liza” v novom svete] // Semiconductor lighting technology [Poluprovodnikovaya svetotekhnika], 2013, # 4, pp. 64–67. 5. Born, M., Wolf, E. Fundamentals of Optics / Moscow, Science, 1973. 6. RF Standard: GOST 70 835–2023 “Museum lighting. Lighting with LEDs”. 7. Rossel, J. “General Physics” / Moscow, Mir, 1984. 8. Optical Design Software Trace Pro Expert (64)- 7.3.4 Release.
Keywords
- light environment
- uniformity of illuminance distribution
- painting
- glare
- illuminator location
- angles of incidence
- reflection
- radiation
- projection optics
- beam path length
- polarization
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